Lab Ultrasonic Nebulizer for AACVD Experiment
$40.96
$68.4
Lab Ultrasonic Nebulizer for AACVD Experiment Introduction This Ultrasonic Nebulizer is an aerosol-assisted chemical vapor deposition (AACVD) device, utilizing liquid aerosols as precursors that grow on a substrate. It is designed for applications such as fuel cell production and the deposition of ZnO transparent conductive films. The instrument consists of two main modules: a high-precision micro-flow liquid transmission system and an ultrasonic atomization system. This technology is suitable for non-volatile precursors and can be widely applied in fields such as nanomaterial preparation and electrode material coating and composites. Application Demonstration Technical Specifications of Ultrasonic Nebulizer Model UA-0.36L Features Infinitely adjustable liquid feed rate, carrier gas, and atomization power Maximum Volume 360mL Atomization Particle Size 5–10 μm Dimensions Length 180 × Depth 210 × Height 260 mm Solution Injection Method Variable-speed peristaltic pump Adjustable Liquid Injection Range 0.04–13 mL/min; memory retention for flow rate, infinitely variable Atomization Power 35W, infinitely adjustable Liquid Tank Material PTFE Safety Protection Non-contact low-liquid-level cutoff Carrier Gas Control Adjustable float flow rate 60–600 mL/min Services 12-month warranty with lifetime support Applications Here are some typical applications for the Ultrasonic Nebulizer: Fuel Cell Production: Deposits catalyst and electrode materials to enhance fuel cell performance. ZnO Transparent Conductive Films: Deposits ZnO films for solar cells, touch screens, and displays. Nanomaterial Synthesis: Provides uniform nanoparticle deposition for electronics and sensors. Electrode Material Coating: Applies uniform coatings for batteries and supercapacitors. Composite Material Deposition: Improves conductivity, corrosion resistance, and other properties of composites. Photovoltaic Cell Fabrication: Deposits light-absorbing and conductive layers for efficient solar cells. Semiconductor Thin Film Deposition: Creates films for integrated circuits and electronic components. Corrosion-Resistant Coatings: Provides protective layers for aerospace and marine applications. Optoelectronic Device Fabrication: Supports production of LEDs, laser diodes, and other devices. Catalytic Layer Deposition: Deposits catalysts for air purification, water treatment, and environmental applications. For Options on Furnaces Please visit our website [High Temperature Furnaces Collection] Get In TouchFill out the form below — free quote and professional suggestion will be sent for reference very soon! Name Email* Message Send
Fuel Cell R&D