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  • Epitaxial Furnace Exhaust Gas Purifier

Epitaxial Furnace Exhaust Gas Purifier

$75.47 $107.17
ZYLAB Epitaxial Furnace Exhaust Gas Purifier Overview The ZYLAB Epitaxial Furnace Exhaust Gas Purifier is a high-efficiency wet scrubbing system specially designed for the treatment of exhaust gases generated during semiconductor epitaxial processes. The system adopts a dual spray chamber and a single packed column design to ensure the safe and efficient removal of silane (SiH₄), phosphine (PH₃), boron trifluoride (BF₃), and other hazardous gases. With an advanced multi-stage washing structure and manual negative-pressure control, this unit achieves up to 99.99% removal efficiency for water-soluble gases while ensuring stable, low-cost operation. Key Features 1. Advanced Structural Design Integrated two spray chambers and one packed column chamber for superior purification performance. Manual negative pressure control allows flexible adjustment according to process requirements. Manual and automatic water replenishment system ensures optimal liquid circulation and scrubbing efficiency. High removal rate of up to 99.99% for water-soluble gases. 2. Wide Range of Gas Handling Effectively treats the exhaust gases generated from epitaxial processes, including:SiH₄, PH₃, GeH₄, SiO₂, B₂H₆, BF₃, N₂O, C₄F₈, CF₄, GeCl₄, SiCl₄, SiHCl₃, Cl₂, BCl₃, CCl₄, CCl₂, F₂, H₂S, NH₃, HCl, H₂SO₄, SO₂, and dust particles. 3. System Components and Control Exhaust Fan Equipped with one exhaust fan for stable operation. The fan does not rely on a frequency converter or negative pressure transmitter for stability. Circulation Pump Includes a magnetically driven circulation pump with outlet filtration for reliability and chemical resistance. Water Supply and Drainage Manual automatic water replenishment design. Manual drainage control for convenient maintenance. Automatic Dosing Control Integrated pH control and automatic dosing system, including: pH probe, metering pump, signal cable, and dosing tank (without agitator). pH range adjustable between 4–6, automatically controlled via PLC feedback. Chemical dosing automatically adjusts according to real-time process conditions. Safety and Protection Features 1. Compressed Air Safety Control Continuous compressed air (2500 L/h) accelerates self-ignition of silane gas, preventing accumulation. Recommended air supply pressure ≥ 7 Bar. 2. Nitrogen Safety Control In emergency or alarm conditions, nitrogen purging is activated to dilute silane gas and reduce explosion risk. 3. Anti-Static Safety Design The exhaust scrubber body is made from anti-static PVC to prevent electrostatic discharge. 4. Wet-Process Safety Control Adopts a wet scrubbing process to reduce heat from silane reactions and achieve hydrolysis, providing effective flame suppression. High Stability and Reliability Continuous compressed-air feeding ensures complete combustion of silane (SiH₄) and maintains system safety within hydrogen limits. Multiple high-speed atomization pre-wash stages guarantee excellent dust and gas removal. The discharge cone structure generates slight negative pressure, enhancing cleaning capacity. Independent water and drainage circuits prevent clogging and allow for continuous operation without downtime. Modular design enables one-click liquid replacement, simplifying maintenance. PLC-based local control panel with a TCP/IP interface for data communication and system integration with external equipment. Environmental Compliance Emission levels comply with: GB16297-1996 – Integrated Emission Standard of Air Pollutants (Class II) GB30484-2013 – Pollutant Discharge Standard for Battery Industry Wastewater Management The scrubbing solution should be replaced every 10–15 days to maintain purification performance. Wastewater is typically near-neutral and can be discharged directly into the facility’s sewage network by simply opening the drain valve—safe, clean, and easy to operate. Project Cases PECVD Furnace and Exhaust Gas Purification System Example Get In TouchFill out the form below — free quote and professional suggestion will be sent for reference very soon! Name Email* Message Send
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