Multi-Zone High Temperature Quartz Tube Annealing Furnace for Wafer Processing

ZYLAB Multi-Zone High Temperature Quartz Tube Annealing Furnace Introduction The ZYLAB Multi-Zone High Temperature Quartz Tube Annealing Furnace for semiconductor wafer annealing, thin film heat treatment, and advanced materials research. Equipped with a 200 mm diameter high-purity quartz tube and three independently controlled heating zones, this furnace ensures excellent temperature uniformity and precise thermal control for demanding wafer processing applications. With intelligent PID self-tuning fuzzy control, high vacuum capability, and a user-friendly 7-inch touchscreen control system, this quartz tube annealing furnace delivers reliable and repeatable performance for laboratories, universities, and semiconductor production environments. This system is ideal for processes requiring precise temperature profiles, controlled atmospheres, or vacuum conditions. Key Features 1. High-Purity Quartz Tube for Clean Processing The furnace is equipped with a high-purity quartz tube (φ200 mm), ensuring minimal contamination during high-temperature wafer annealing and semiconductor processing. 2. Three Independent Multi-Zone Temperature Control Three individually controlled heating zones allow precise creation of uniform or gradient temperature profiles, making it ideal for: Semiconductor wafer annealing Thin film annealing Diffusion processes Materials research 3. High Precision PID Temperature Control Advanced PID self-learning fuzzy control system provides excellent temperature stability and accuracy within ±1°C, ensuring consistent and repeatable results. 4. High Vacuum Capability The furnace supports vacuum operation with an ultimate vacuum level of 10 Pa, suitable for vacuum annealing and controlled atmosphere processing. 5. User-Friendly 7-inch Touchscreen Interface The integrated 7-inch touchscreen control panel provides intuitive operation, programmable temperature profiles, and real-time monitoring. 6. Reliable and Durable Heating System High-quality Fe-Cr-Al alloy heating elements provide: Long service life Stable heating performance High temperature capability up to 1150°C Applications of High Temperature Quartz Tube Annealing Furnace Semiconductor wafer annealing Silicon wafer thermal processing Thin film annealing Diffusion and oxidation processes Semiconductor material research Nanomaterials heat treatment Electronic materials processing University and research laboratory applications Technical Specifications of High Temperature Quartz Tube Annealing Furnace Model O1200-200 Power Supply Three-phase 380V, 50Hz Rated Power 20 kW Heating Element High-quality Fe-Cr-Al alloy wire Temperature Accuracy ±1°C Temperature Sensor Type K-type thermocouple Maximum Temperature (Tmax) 1150°C Long-term Operating Temperature 300~1150°C Heating Zone Dimensions φ200 × (300 400 300) mm Tube Material High-purity quartz tube Furnace Dimensions (L×D×H) 2000 × 770 × 1300 mm Heating Rate 1°C/H – 20°C/Min Ultimate Vacuum 10 Pa Weight Approx. 400 kg Sealing System Heating Chamber Gas Flow Control (Dual Float Flow Meters) For More Content Please read our blog: Analysis of Tube Furnace: Applications, Advantages, and Operations For More Options on Tube Furnaces Please visit our website [Tube Furnaces] For More Options on High Temperature Furnaces Please visit our website [High Temperature Furnaces Collection] Get In TouchFill out the form below — free quote and professional suggestion will be sent for reference very soon! Name Email* Message Send