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  • Five-Temperature Zone CVD Furnace

Five-Temperature Zone CVD Furnace

$40.17 $76.32
Five-Temperature Zone CVD Furnace Applications: Chemical Vapor Deposition (CVD) Synthesize coatings or nanomaterials Depositing thin film materials Synthesize insulating materials as well as most metal and metal alloy materials. Fields: Semiconductor industry Materials laboratories Universities Research institutes Environmental science and other fields Introduction: Chemical Vapor Deposition (CVD) refers to a method where chemical gases or vapors react on the surface of a substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry for depositing thin film materials, including a broad range of insulating materials as well as most metal and metal alloy materials. In response to this, we have developed a comprehensive CVD coating system suitable for materials laboratories in major universities, research institutes, environmental science, and other fields. Five-Temperature Zone CVD Furnace consists of the following components:  Sintering System;  Electrical Control System; Top Cover Opening System; Vacuum System. Main Features: Stable and reliable control, user-friendly operation. Utilizes advanced PID self-learning fuzzy control for high temperature control accuracy, maintaining within ±1℃. Furnace lining adopts high-purity alumina lightweight fiber material, providing superior insulation and energy efficiency. Data storage function, capable of retaining essential sintering parameters for up to 30 days (with 8 hours of operation per day). Formula management function, able to store and retrieve more than 100 pre-set formulas. Independent control of five temperature zones, allowing for a diverse and complex sintering process tailored to customer requirements. Networking capability through RJ45 interface, employing TCP/IP protocol for seamless connection to an upper-level system (requires installation of corresponding software on the upper-level system). Technical Parameters: Model T1200-100T5G4F   Power supply 380V 50HZ   Rated power 10KW   Thermocouple K type Max temperature 1150.C Recommend Heating rate 10.C/min Furnace heating chamber Dia 150* 1135mm Tube size Dia 100* 1600mm Temperature accuracy /- 1 ℃ Heating element Molybdenum-Doped Fe-Cr-Al Alloy High-Temperature Heating Wire   Sealing System Vacuum level:≤10Pa(Mechanical Pump) Pressure Measurement and Monitoring Utilizing a mechanical pressure gauge with shock-absorbing oil to introduce damping effects during pressure fluctuations, reducing the back-and-forth oscillation of the pointer.     Control System Sintering Process Curve Settings: Dynamically display and set curves; the equipment allows for the storage of multiple sintering process curves, and each curve can be freely configured. Scheduled Sintering: Enable unattended sintering by pre-scheduling sintering process curves. Real-time Display of Sintering Parameters: Real-time display of sintering power, voltage, and other information; recording of sintering data with the option to export for paperless records. Remote Control Capability: Capable of remote operation and real-time monitoring of equipment status. Temperature Calibration: Non-linear correction of the entire sintering process based on the temperature difference between the main control temperature and the sample temperature. Protection Built in protection for over-heated and broken thermal couple, and leakage.       Dimension 1900(L) * 900(W) * 1250(H)mm       Weight 350KG Warranty One-year warranty, lifetime support (excluding consumable parts such as furnace tubes, O-rings ) Get In TouchFill out the form below — free quote and professional suggestion will be sent for reference very soon! Name Email* Message Send
Thin-Film Battery R&D

Thin-Film Battery R&D

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