Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition

Dual-Furnace Sliding PECVD System for High-Precision Nanowire and Thin Film Deposition Introduction The Dual Furnace Sliding PECVD system features a dual-temperature zone tube furnace, incorporating a 500W RF generator, two movable independent sintering furnaces, a high-precision mass flow mixing system, and a stable anti-backlash vacuum system. It is designed for the growth of nanowires and the fabrication of various thin films using the CVD method. Key Features One-Step Cleaning and Coating: Ensures no secondary contamination during the process. Top-Opening Structure: Facilitates easy observation of the samples during the process. Fully Automatic Control: Touchscreen interface with digital display for easy operation. Fast Heating and Cooling: Achieved through the sliding furnace body for quick thermal response. Stable RF Power Supply: Ensures uniform temperature distribution, improving film quality. Technical Parameters Model PECVD-1200-50-2 Power Supply AC 220V, 3KW; RF Power: 300W or 500W, 13.56 MHz Maximum Temperature 1200°C (<1 hour) Continuous Temperature 1100°C (continuous operation) Heating Rate ≤20°C/min Heating Zone Length 200mm 200mm (split design for maximum temperature gradient control) Furnace Tube Dimensions Φ50*1800mm RF Coil Multi-node, silver-plated, water-cooled copper coil for compatibility with various RF power supplies Control System 1.      Dynamic display of sintering curves and the ability to save and customize multiple process curves 2.      Scheduled sintering for unattended operation 3.      Real-time monitoring of sintering power and voltage, with data logging and export for paperless record-keeping 4.      Remote control and real-time equipment status monitoring 5.      Nonlinear temperature correction during the sintering process for both the furnace and sample Temperature Accuracy ±1°C Heating Element Mo-doped Fe-Cr-Al alloy Sealing System Come with Stainless Steel Sealing Flange. Vacuum level of 10Pa (mechanical pump)。 （Pressure Measurement and Monitoring：Using a digital vacuum gauge allows for a clear display of the equipment’s vacuum level, ensuring more accurate experimental data and results.） Gas Supply System Integrated mass flow controller Net Weight 100kg Usage Precautions 1.      Do not open the furnace when the temperature exceeds 300°C to prevent injury. 2.      The furnace tube pressure must not exceed 0.125MPa (absolute pressure) to avoid damage to the sealing flange. 3.      When operating at high vacuum (10⁻³Pa), the temperature should not exceed 800°C. Service Support Includes a one-year limited warranty and lifetime support (excluding consumable parts like processing tubes and O-rings). Replacement parts can be ordered as needed. Applications The Dual Furnace Sliding PECVD System is primarily used for: Nanowire Growth: Ideal for growing nanowires, which are crucial in applications like nanoelectronics, sensors, and advanced materials development. Thin Film Deposition: Used in Chemical Vapor Deposition (CVD) processes to create various thin films for semiconductor devices, solar cells, coatings, and other electronic components. Material Research and Development: Suitable for developing new materials and coatings in research environments, particularly in fields like nanotechnology, materials science, and electronics. Semiconductor Fabrication: Employed for depositing thin films used in the production of semiconductors, photovoltaic devices, and other microelectronics. For More Options on PECVD System Please visit our website [PECVD System Collection] Get In TouchFill out the form below — free quote and professional suggestion will be sent for reference very soon! Name Email* Message Send